A REFLECTIVE OPTICAL ELEMENT AND METHOD OF PRODUCING IT

摘要

In order to limit the negative effect of metal contamination on reflectivity within an EUV lithography device, a reflective optical element (50) is proposed for the extreme ultraviolet and soft X-ray wavelength range with a reflective surface (59) with an uppermost layer (56), in which the uppermost layer (56) comprises one or more organic silicon compounds with a carbon-silicon and/or silicon-oxygen bond.