发明名称 Verfahren zur Herstellung einer Mikrostruktur und eines mit der Mikrostruktur versehenen Substrats
摘要 <p>A method is provided for manufacturing a microstructure on a substrate in which the substrate has thereon linear and parallel atomic steps. The microstructure includes linear elements that extend along the atomic steps. The method includes a step for preparing a substrate having atomic steps on its surface and a step for applying linear elements onto the substrate. Each linear element is oriented to extend along one of the atomic steps, with the result that a microstructure in which the linear elements extend along the atomic steps is formed on the substrate. The substrate can be prepared by subjecting a silicon carbide substrate, a sapphire substrate, or a zinc oxide substrate to an ultrasmoothing process. As the linear elements, peptide fibers can be employed that are made up of peptide molecules that formβ-sheet structures.</p>
申请公布号 DE112009000353(T5) 申请公布日期 2011.02.24
申请号 DE20091100353T 申请日期 2009.02.16
申请人 FUJIMI INCORPORATED;NATIONAL UNIVERSITY CORPORATION NAGOYA INSTITUTE OF TECHNOLOGY 发明人 ERYU, OSAMU;KINOSHITA, TAKATOSHI;KAWATA, KENJI;HOTTA, KAZUTOSHI
分类号 B82B3/00;B82B1/00 主分类号 B82B3/00
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