发明名称 MULTIPLE OXIDE SINTERED COMPACT, SPUTTERING TARGET, MULTIPLE OXIDE AMORPHOUS FILM AND PRODUCTION METHOD THEREOF, AND MULTIPLE OXIDE CRYSTALLINE FILM AND PRODUCTION METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a multiple oxide crystalline film low in resistivity and excellent in light transmittance. <P>SOLUTION: The multiple oxide sintered compact is mainly composed of indium, strontium and oxygen, where ratios of the number of atoms of tin and strontium to the total number of atoms of indium, strontium and tin in the multiple oxide sintered compact are 0-0.3 and 0.0001-0.05, respectively, the relative density is 97% or more, and the mean particle size is 7 &mu;m or less. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011037679(A) 申请公布日期 2011.02.24
申请号 JP20090187772 申请日期 2009.08.13
申请人 TOSOH CORP 发明人 KURAMOCHI TOSHIHITO;MATSUMARU KEITARO;SHIBUTAMI TETSUO
分类号 C04B35/457;C23C14/34;H01B5/14;H01B13/00 主分类号 C04B35/457
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