发明名称 EXPOSURE CONTROL APPARATUS, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND EXPOSURE APPARATUS
摘要 According to one embodiment, an exposure control apparatus includes exposure setting unit that performs an exposure setting of setting an exposure shot as a shot that is exposed or a shot that is not exposed based on height information on a height of a substrate in the exposure shot arranged in a substrate peripheral portion, and an exposure instructing unit that outputs an exposure instruction to the shot that is exposed and an instruction to skip an exposure to the shot that is not exposed.
申请公布号 US2011043776(A1) 申请公布日期 2011.02.24
申请号 US20100832600 申请日期 2010.07.08
申请人 FUJISAWA TADAHITO 发明人 FUJISAWA TADAHITO
分类号 G03B27/42 主分类号 G03B27/42
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