发明名称 |
SPECTRAL PURITY FILTERS FOR USE IN A LITHOGRAPHIC APPARATUS |
摘要 |
A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The apertures extend though the member in different directions in order to be substantially in alignment with radiation constituting a non-parallel beam of radiation.
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申请公布号 |
US2011044425(A1) |
申请公布日期 |
2011.02.24 |
申请号 |
US20100860634 |
申请日期 |
2010.08.20 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JAK MARTIN JACOBUS JOHAN;BANINE VADIM YEVGENYEVICH;VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;SOER WOUTER ANTHON;YAKUNIN ANDREY MIKHAILOVICH |
分类号 |
G03B27/72;G02B5/20;G21K3/00;G21K5/00 |
主分类号 |
G03B27/72 |
代理机构 |
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代理人 |
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主权项 |
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