发明名称 CORRUGATED-QUANTUM WELL INFRARED PHOTODETECTOR WITH REFLECTIVE SIDEWALL AND METHOD
摘要 A quantum well infrared photodetector comprising a tunable voltage source; first and second contacts operatively connected to the tunable voltage source; a substantially-transparent substrate adapted to admit light; first and second layers operatively connected to the first and second contacts; a quantum well layer positioned between the first and second layers; light admitted through the substantially transparent substrate entering at least one of the first and second layers and passing through the quantum well layer; at least one side wall adjacent to at least one of the first and second layers and the quantum well layer; the at least one side wall being substantially non-parallel to the incident light; the at least one sidewall comprising reflective layer which reflects light into the quantum well layer for absorption. A preferred method for improving the reflectivity of a quantum well infrared photodetector comprises forming a first sidewall layer on the sidewalls of the corrugated quantum well infrared photodetector; forming a second sidewall layer on the sidewalls of the corrugated quantum well infrared photodetector; the second sidewall layer being formed of a reflective material and the first sidewall layer operating to electrically isolate the reflective material from at least one of the first and second contact layers; whereby the reflective metal operates to reflect light rays into corrugated quantum well infrared photodetector device and to substantially prevent infrared rays in environment from entering through the sidewalls.
申请公布号 US2011042647(A1) 申请公布日期 2011.02.24
申请号 US20090543121 申请日期 2009.08.18
申请人 U.S. GOVERNMENT AS REPRESENTED BY THE SECRETARY OF THE ARMY 发明人 CHOI KWONG-KIT
分类号 H01L31/0352;H01L31/18 主分类号 H01L31/0352
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