发明名称 |
CORRUGATED-QUANTUM WELL INFRARED PHOTODETECTOR WITH REFLECTIVE SIDEWALL AND METHOD |
摘要 |
A quantum well infrared photodetector comprising a tunable voltage source; first and second contacts operatively connected to the tunable voltage source; a substantially-transparent substrate adapted to admit light; first and second layers operatively connected to the first and second contacts; a quantum well layer positioned between the first and second layers; light admitted through the substantially transparent substrate entering at least one of the first and second layers and passing through the quantum well layer; at least one side wall adjacent to at least one of the first and second layers and the quantum well layer; the at least one side wall being substantially non-parallel to the incident light; the at least one sidewall comprising reflective layer which reflects light into the quantum well layer for absorption. A preferred method for improving the reflectivity of a quantum well infrared photodetector comprises forming a first sidewall layer on the sidewalls of the corrugated quantum well infrared photodetector; forming a second sidewall layer on the sidewalls of the corrugated quantum well infrared photodetector; the second sidewall layer being formed of a reflective material and the first sidewall layer operating to electrically isolate the reflective material from at least one of the first and second contact layers; whereby the reflective metal operates to reflect light rays into corrugated quantum well infrared photodetector device and to substantially prevent infrared rays in environment from entering through the sidewalls.
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申请公布号 |
US2011042647(A1) |
申请公布日期 |
2011.02.24 |
申请号 |
US20090543121 |
申请日期 |
2009.08.18 |
申请人 |
U.S. GOVERNMENT AS REPRESENTED BY THE SECRETARY OF THE ARMY |
发明人 |
CHOI KWONG-KIT |
分类号 |
H01L31/0352;H01L31/18 |
主分类号 |
H01L31/0352 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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