发明名称 |
Stabilizers for Vinyl Ether Resist Formulations for Imprint Lithography |
摘要 |
Coating compositions suitable for UV imprint lithographic applications include at least one vinyl ether crosslinker having at least two vinyl ether groups; at least one diluent comprising a monofunctional vinyl ether compound; at least one photoacid generator soluble in a selected one or both of the at least one monofunctional vinyl ether compound and the at least one vinyl ether crosslinker having the at least two vinyl ether groups; and at least one stabilizer comprising an ester compound selectively substituted with a substituent at an ester position or an alpha and the ester positions. Also disclosed are imprint processes. |
申请公布号 |
US2011042862(A1) |
申请公布日期 |
2011.02.24 |
申请号 |
US20090545161 |
申请日期 |
2009.08.21 |
申请人 |
INTERNATIONAL BUSINESS CORPORATION |
发明人 |
HOULE FRANCES A.;SWANSON SALLY A.;FURUKAWA TAIICHI |
分类号 |
B29C35/08;B29C59/02;G03F7/004 |
主分类号 |
B29C35/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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