OBJECT PROCESSING APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

A plurality of air levitation units (50) that jet air to the lower surface of a substrate (P) are placed below the substrate (P), and the substrate (P) is supported in a noncontact manner so as to be substantially horizontal. Further, a portion subject to exposure of the substrate (P) is held from below in a noncontact manner by a chuck main body (81) that a fixed-point stage (40) has, and a surface position of the portion subject to exposure is adjusted in a pinpoint manner. Consequently, exposure can be performed on the substrate (P) with high precision. Since the chuck main body (81) moves in a scanning direction according to the position of the substrate, the chuck main body can surely hold the substrate even when the substrate proceeds into an exposure area (IA).