| 发明名称 |
IMPRINT LITHOGRAPHY APPARATUS AND METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an improved imprint lithography apparatus and a method. <P>SOLUTION: This imprint lithography apparatus includes: an imprint template holder 22 which is constituted in a manner to hold an imprint template 20; and a plurality of position sensors 28 which are constituted in a manner to measure the variation of the size and/or shape of the imprint template 20, and the position sensors 28 are mechanically separated from the imprint template 20. In addition, the imprint template 20 is used in order to imprint a pattern on a board 34, and the variation of the size and/or shape of the imprint template 20 are measured while the pattern is imprinted on the board 34 by this lithography method. <P>COPYRIGHT: (C)2011,JPO&INPIT |
| 申请公布号 |
JP2011037261(A) |
申请公布日期 |
2011.02.24 |
| 申请号 |
JP20100147035 |
申请日期 |
2010.06.29 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
KRUIJT-STEGEMAN YVONNE WENDELA;JEUNINK ANDRE BERNARDUS;DEN BOEF ARIE JEFFREY;BANINE VADIM YEVGENYEVICH;RENKENS MICHAEL JOZEF MATHIJS;GERARD VAN SCHOTHORST;DIJKSMAN JOHAN FREDERIK;SCHOORMANS CAROLUS JOHANNES CATHARINA;KOEVOETS ADRIANUS HENDRIK;DE SCHIFFART CATHARINUS;WUISTER SANDER FREDERIK |
| 分类号 |
B29C59/02;B81C99/00;H01L21/027 |
主分类号 |
B29C59/02 |
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