PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

A microwave supply means (20) provided in a plasma processing apparatus (11) comprises stub members (51) able to extend from an outer conductor (33) side toward the inner conductor (32) side. The stub members (51) are used as changing means for changing a distance, in the radial direction, between a portion of a peripheral surface (36) of an inner conductor (32) and an opposing part opposing that portion of the peripheral surface of the inner conductor (32) in the radial direction. The opposing part is a cooling plate projected part (47). Each stub member (51) includes a bar-shaped part (52) supported on the outer conductor (33) side so as to extend in the radial direction, and a screw (53) serving as a movement amount adjustment member for adjusting the amount of movement of the bar-shaped member (52) in the radial direction.