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发明名称
Lithography apparatus and device manufacturing method
摘要
申请公布号
EP1921505(B1)
申请公布日期
2011.02.23
申请号
EP20070254361
申请日期
2007.11.05
申请人
ASML NETHERLANDS BV;CARL ZEISS SMT AG
发明人
JANSEN, BASTIAAN STEPHANUS HENDRICUS;LOOPSTRA, ERIK ROELOF;RAVENSBERGEN, MARIUS;HAUF, MARKUS JOSEF
分类号
G03F7/20
主分类号
G03F7/20
代理机构
代理人
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地址
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