发明名称 Charged-particle beam writing apparatus and charged-particle beam writing method
摘要 A timing control circuit controls the timing for applying a voltage to a sub deflector when changing a position to be irradiated with the charged-particle beam. A control computer compares a target line width and a line width of a pattern written with the timing for applying voltage to the sub deflector changed, and determines appropriate timing for applying voltage to the sub deflector from a timing range corresponding to a predetermined allowable range of the difference between the target line width and the line width of the written pattern. The control computer then controls the timing control circuit based on the determined timing.
申请公布号 US7893411(B2) 申请公布日期 2011.02.22
申请号 US20080239116 申请日期 2008.09.26
申请人 NUFLARE TECHNOLOGY, INC. 发明人 NISHIMURA RIEKO;HATTORI KIYOSHI
分类号 H01J37/317 主分类号 H01J37/317
代理机构 代理人
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