发明名称 |
SPECTRAL PURITY FILTERS FOR USE IN A LITHOGRAPHIC APPARATUS. |
摘要 |
A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation, A first region of the spectral purity filter has a first configuration that results in a first radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength, and a second region of the spectral purity filter has a second, different configuration that results in a second, different radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength. |
申请公布号 |
NL2005118(A) |
申请公布日期 |
2011.02.22 |
申请号 |
NL20102005118 |
申请日期 |
2010.07.21 |
申请人 |
ASML NETHERLANDS B.V., |
发明人 |
SOER, WOUTER;BANINE, VADIM;HERPEN, MAARTEN;YAKUNIN, ANDREI;JAK, MARTIN |
分类号 |
G03F7/20;G21K1/06 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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