发明名称 |
SUBSTRATE POLISHING APPARATUS AND METHOD FOR DETECTING SLIP OF SUBSTRATE THEREOF |
摘要 |
PURPOSE: The substrate polishing article and their substrate slip sensing method on a real time basis sense the slip of substrate by using the vision exerciser among the loading and polishing of substrate. CONSTITUTION: It absorbs in a vacuum the substrate(W) and the spin head clinches. The polishing head(132) trains substrate in contact with the substrate fixed to the spin head. The vision exerciser(190) on a real time basis monitors the seating state of the substrate settled in the spin head. The vision exerciser comprises the camera(192) getting the capture image about the substrate settled in the spin head.
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申请公布号 |
KR20110017675(A) |
申请公布日期 |
2011.02.22 |
申请号 |
KR20090075265 |
申请日期 |
2009.08.14 |
申请人 |
SEMES CO., LTD. |
发明人 |
CHOI, JUNG BONG;JUNG, PYEONG SOON |
分类号 |
H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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