发明名称 |
Gas distribution plate assembly for plasma reactors |
摘要 |
A baffle plate assembly for distributing gas flows into an adjacent process chamber containing a semiconductor wafer to be processed includes a planar gas distribution portion having a plurality of apertures therein; a flange surrounding the gas distribution portion; and an impingement device centrally attached to the gas distribution portion, wherein the device includes a cap and a stem, the stem being in thermal contact with the gas distribution portion. Also disclosed herein are plasma reactors employing the baffle plate assembly and methods for reducing recombination of species in a plasma.
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申请公布号 |
US7892357(B2) |
申请公布日期 |
2011.02.22 |
申请号 |
US20040755617 |
申请日期 |
2004.01.12 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
SRIVASTAVA ASEEM K. |
分类号 |
C23C16/455;C23C16/06;C23C16/22;C23C16/44;H01J37/32;H01L21/00 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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