BLANK MASK AND PHOTO MASK AND METHOD FOR MANUFACTURING THEREOF

摘要

PURPOSE: A blank mask for manufacturing a semiconductor or flat panel display device is provided to resolve problems of scum, footing, and skin layer. CONSTITUTION: A blank mask for manufacturing a semiconductor or flat panel display device comprises one or more layers selected from phase shaft layer, light-shielding layer(30) or anti-reflection layer(40) which are laminated on a transparent substrate(10). The concentration of sulfuric acid and ammonium ion is under 100 ppbv on the top layer of the blank mask. A metal ingredient of the light-shielding layer and/or anti-reflection layer contains chrome(Cr). The top layer of the blank mask is treated by HMDS method. The blank mask further contains a photoresist formed on the top layer.