BLANKMASK, PHOTOMASK AND IT'S MANUFACTURING METHOD

摘要

PURPOSE: A method for manufacturing a blank mask is provided to improve product quality of the blank mask and to improve CD MTT and CD uniformity. CONSTITUTION: A method for manufacturing a blank mask comprises: a step of preparing a transparent substrate(10); a step of forming a metal film on the transparent substrate; a step of forming a hard mask layer(40) on the metal film; a step of performing selective thermal treatment on the metal film and hard mask layer; and a step of forming a resist film(50). The surface treatment of the hard mask layer is performed using a vacuum rapid thermal processing device, vacuum hot plate, and vacuum lamp.