| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition which is used to form a pattern by ultraviolet exposure and development, enables to convert the formed pattern to a pattern of a forward tapered shape excellent in smoothness when the formed pattern is heat treated, and forms a coating film excellent in heat resistance and weatherability. <P>SOLUTION: The photosensitive composition includes a photosensitive resin obtained by reacting 1 mol of a carboxyl group in a copolymer (I), obtained by radical polymerization of an ethylenically unsaturated monomer (M) including 10-90 wt.% of a carboxyl group-free ethylenically unsaturated monomer (a) having a formula weight of 70-120 and 10-70 wt.% of a carboxyl group-containing ethylenically unsaturated monomer (b), with 0.2-0.9 mol of an epoxy group in an epoxy group-containing ethylenically unsaturated monomer (c). <P>COPYRIGHT: (C)2011,JPO&INPIT |
