摘要 |
<p>A process for the manufacture of Sevoflurane CF3-CH(OCH2F)-CF3 which comprises (a) manufacturing a substituted malonic acid derivative of formula (I) or (II): R1OOC-CH(OCH2X)-COOR2 (I) or R3HNOC-CH (OCH2X)-CONHR4 (II) wherein X is OH or a leaving group which can be substituted by nucleophilic substitution and R1, R2, R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom,, an aralkyl group or an aryl group, (b) further reacting said malonic acid derivative as intermediate for the manufacture of Sevoflurane CF3-CH(OCH2F)-CF3</p> |