| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus that performs predetermined processing while rotating a substrate, the substrate processing apparatus uniformly pressing the substrate against a support member. SOLUTION: A plurality of support pins 310 which are stood are provided at a peripheral edge of a spin base 30. Then, the substrate W is supported on the support pins 310 in a substantially horizontal state. In a state where a shield member 50 is arranged closely opposite a surface Wf of the substrate W, a gas is discharged from a gas discharge port 502 to the substrate W at a predetermined angle. Consequently, the substrate W is pressed against the support pins 310 with the gas supplied to its upper surface side at the predetermined angle to be reliably held over the spin base 30. COPYRIGHT: (C)2011,JPO&INPIT
|
