| 摘要 |
The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): wherein Rc2 represents a C7-C20 aralkyl group which can have one or more substituents, and Rc1 represents a group represented by the formula (1): wherein Rc3 and Rc4 each independently represent a hydrogen atom or a linear, branched chain or cyclic C1-C12 aliphatic hydrocarbon group, Rc5 represents a C1-C30 divalent organic group, and Rc3 and Rc4 or Rc5 can be bonded each other to form a ring together with the nitrogen atom to which Rc3 and Rc4 or Rc5 are bonded.
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