摘要 |
The present invention provides an etchant composition for a metal film comprising at least one film selected from an indium-based transparent conductive film, an aluminum-based metal film and a titanium-based metal film, used for the interconnect of a pixel electrode, a gate electrode, a source electrode and a drain electrode. The etchant composition is excellent in etching characteristics to an indium-based transparent conductive film, an aluminum-based metal film and a titanium-based metal film, respectively, and particularly to an Al-La-based alloy film. In addition, the etchant composition can effectively etch a tri-layered film comprising an indium-based transparent conductive film, an Al-La-based alloy film and a titanium-based metal film at a time. |
申请人 |
DONGWOO FINE-CHEM CO., LTD.;YANG, SEUNG-JAE;LEE, SUCK-JUN;JANG, SANG-HOON;LEE, JOON-WOO;LIM, MIN-KI;KWON, O-BYOUNG;PARK, YOUNG-CHUL |
发明人 |
YANG, SEUNG-JAE;LEE, SUCK-JUN;JANG, SANG-HOON;LEE, JOON-WOO;LIM, MIN-KI;KWON, O-BYOUNG;PARK, YOUNG-CHUL |