| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high-sensitivity positive photosensitive resin composition reduced in exposure time. <P>SOLUTION: The positive photosensitive resin composition includes (a) a polymer having a structure represented by formula (I), (b) a naphthoquinonediazide compound, (c) a solvent, and (d) an iodonium compound, and satisfies either condition selected from the condition (i) and the condition (ii). The condition (i) is that the iodonium compound of (d) has a frame of a polycyclic aromatic ring formed by two or more monocyclic aromatic rings being condensed. The condition (ii) is that the positive photosensitive resin composition includes (e) an optical pumping accelerator having a frame of a polycyclic aromatic ring formed by two or more monocyclic aromatic rings being condensed, together with the iodonium compound of (d). <P>COPYRIGHT: (C)2011,JPO&INPIT |
