| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus and an exposure method for attaining a high-quality exposure image in a short tact time with an inexpensive apparatus configuration. <P>SOLUTION: The exposure apparatus includes: a light source device 5; a stage 3 on which a substrate K is placed; a plurality of exposure units 7 which are disposed on the stage obliquely at different heights with respect to a direction X of relative movement in plan view, and are configured to project marking 72M formed by DMDs 72 onto a substrate so as to be irradiated with laser beam; and switching means 65, 75 which change the laser light with which the substrate is irradiated by the exposure units, in an order from an exposure unit 7A which first passes over the substrate to an exposure unit 7C which passes last over the substrate, every time the stage and the exposure units relatively move for a distance D1 from an exposure end position P0 of one of adjacent exposure units to an exposure start position P1 of the other. <P>COPYRIGHT: (C)2011,JPO&INPIT |
