PLASMA TREATMENT CHAMBER HAVING SWITCHABLE BIAS FREQUENCY, AND SWITCHABLE MATCHING NETWORK

摘要

PROBLEM TO BE SOLVED: To provide a plasma treatment chamber having a switchable bias frequency superposed on a plasma source frequency and also applied to a cathode.

SOLUTION: A power supplier capable of generating multiple RF bias frequencies is coupled to a single matching network via a switch. The matching network couples one of the bias frequencies to the cathode. Another matching network applies a source RF power to the cathode. One parallel connection of a variable shunt capacitor and a fixed capacitor is arranged between a ground and the switch, and another connection of the variable shunt capacitor and the fixed capacitor is arranged between the ground and the matching network of the source RF.

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