FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-READABLE STORAGE MEDIUM

摘要

PURPOSE: A film forming apparatus, a film forming method, and a computer readable record medium are provided to form a thin film by depositing layer of reaction product by repetitively implementing the supplying cycle which supplies the two kinds of reaction gas to the surface of the substrate. CONSTITUTION: A first reaction gas supply unit(31) supplies the first reaction gas to a substrate(W). A second reaction gas feeding unit(32) supplies the second reaction gas to the substrate. An activation gas injector(220) implements the modification treatment of the reaction product on the top of the substrate. The activation gas injector comprises a pair of parallel electrodes and a gas supply part supplying the process gas between the parallel electrodes.