发明名称 HETEROJUNCTION BIPOLAR TRANSISTORS AND METHODS OF MANUFACTURE
摘要 PURPOSE: A hetrojunction bipolar transistor and a manufacturing method thereof are provided to minimize the TDDB(Time-Dependent Dielectric Breakdown) by minimizing the space requirement while maximizing the current flow from the emitter and collector areas. CONSTITUTION: A collector(14), a SiGe base(16), and an emitter(18) are formed on a substrate(12). A wiring structure(24a) is formed within an dielectric(22) layer. A contact structure(24b) is electrically connected to the SiGe base. A contact structure(24c) is electrically connected to the emitter. A first wiring level(28) is formed by the dual damascene processing.
申请公布号 KR20110016395(A) 申请公布日期 2011.02.17
申请号 KR20100071559 申请日期 2010.07.23
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 STAMPER ANTHONY K.;DUNN JAMES STUART;JOSEPH ALVIN JOSE
分类号 H01L21/331;H01L29/72 主分类号 H01L21/331
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