发明名称 |
HETEROJUNCTION BIPOLAR TRANSISTORS AND METHODS OF MANUFACTURE |
摘要 |
PURPOSE: A hetrojunction bipolar transistor and a manufacturing method thereof are provided to minimize the TDDB(Time-Dependent Dielectric Breakdown) by minimizing the space requirement while maximizing the current flow from the emitter and collector areas. CONSTITUTION: A collector(14), a SiGe base(16), and an emitter(18) are formed on a substrate(12). A wiring structure(24a) is formed within an dielectric(22) layer. A contact structure(24b) is electrically connected to the SiGe base. A contact structure(24c) is electrically connected to the emitter. A first wiring level(28) is formed by the dual damascene processing.
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申请公布号 |
KR20110016395(A) |
申请公布日期 |
2011.02.17 |
申请号 |
KR20100071559 |
申请日期 |
2010.07.23 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
STAMPER ANTHONY K.;DUNN JAMES STUART;JOSEPH ALVIN JOSE |
分类号 |
H01L21/331;H01L29/72 |
主分类号 |
H01L21/331 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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