发明名称 PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
摘要 An upper electrode 20 according to one embodiment of the present invention includes: a counter portion 22 having a counter face 22A facing a placing face 10A; a periphery portion 24 having a flat face 24A connecting to a periphery of the counter face 22A; and multiple convex portions 26 formed on the counter face 22A. On a projection plane substantially parallel to the placing face 10A, the periphery of the counter portion 22 overlaps the periphery of the lower electrode 10, and a periphery of the periphery portion 24 surrounds a periphery of the counter portion 22.
申请公布号 US2011039414(A1) 申请公布日期 2011.02.17
申请号 US20090922961 申请日期 2009.03.18
申请人 SANYO ELECTRIC CO.,LTD. 发明人 AYA YOUICHIROU
分类号 H01L21/3065;H01L21/302 主分类号 H01L21/3065
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