QUARTZ WINDOW HAVING GAS FEED AND PROCESSING EQUIPMENT INCORPORATING SAME
摘要
Methods and apparatus for providing a process gas to a substrate in a processing system are disclosed herein. In some embodiments, the substrate processing system may include a process chamber having a substrate support disposed therein; a light source disposed above the process chamber to direct energy towards the substrate support; and a window assembly disposed between the light source and the substrate support to allow light energy provided by the light source to enter the process chamber towards the substrate support, wherein the window assembly includes an inlet to receive a process gas and one or more outlets to distribute the process gas into the process chamber.
申请公布号
WO2010123741(A3)
申请公布日期
2011.02.17
申请号
WO2010US31157
申请日期
2010.04.15
申请人
APPLIED MATERIALS, INC.;KIM, TAE JUNG;RIPLEY, MARTIN