发明名称 NONVOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 According to one embodiment, a nonvolatile memory device includes a substrate, a first electrode, a second electrode, and a memory. The first electrode is provided on the substrate. The second electrode crosses on the first electrode. The memory portion is provided between the first electrode and the second electrode. At least one of an area of a first memory portion surface of the memory portion opposed to the first electrode and an area of a second memory portion surface of the memory portion opposed to the second electrode is smaller than an area of a cross surface of the first electrode and the second electrode opposed to each other by the crossing.
申请公布号 US2011037045(A1) 申请公布日期 2011.02.17
申请号 US20100876870 申请日期 2010.09.07
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 FUKUMIZU HIROYUKI;HAYAMIZU NAOYA;TANGE MAKIKO
分类号 H01L45/00;H01L21/02 主分类号 H01L45/00
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