| 摘要 |
PURPOSE: A measuring device, a light exposing device and a device manufacturing method are provided to detect interference light since a plurality of detection units move the relative movement between a test surface and a measuring unit, which comprises an image taking device and an optical system. CONSTITUTION: A measuring device(1) comprises an image taking device(24) and an optical system. The image taking device comprises a detection unit. The detection unit is formed to detect an interference light, which is formed by a measured light from a test surface and a reference light from a reference surface. The optical system is formed to guide the measured light and the reference light to the detection units. The reference surface is arranged so that a difference occurs on an optical path difference between a reference light beam and a measured light beam, which respectively enter the detection units. Measured light beams, which are reflected from a plurality of measured points on the test surface, and reference light beams, which are reflected from a plurality of reference points on the reference surface, respectively enter the detection units.
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