| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To stably form a functional film having predetermined properties even in the case that a base material is made thin for the purpose of the thickness reduction and cost reduction of the functional film in a method for forming a lamination type functional film like a lamination type gas barrier film. <P>SOLUTION: In forming the lamination type gas barrier film, at least one material film is 50μm or thinner in thickness and has an inorganic film and a substrate layer. At the formation of the material film, warpage generated by forming the substrate layer is corrected by forming the inorganic film. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
