| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam drawing method and a charged particle beam drawing apparatus for controlling change in sizes by resist heating process and for improving throughput. SOLUTION: The sub-deflection area 203 is divided into a first sub-deflection area 201 and a second sub-deflection area 202 arranged in the checkered pattern. Next, after shot of the first sub-deflection area 201, the second sub-deflection area 202 is shot. After shot of the sub-deflection area 203, the neighboring sub-deflection area 204 is also shot. After shot of all sub-deflection areas within the main-deflection area 205, the first sub-deflection 203 is in turn shot again. With repetition of this process, all sub-deflection areas in the main deflection area 205 are repeatedly shot. COPYRIGHT: (C)2011,JPO&INPIT |
