| 摘要 |
Method for cleaning an exhaust gas or a process gas of a manufacturing process of semiconductor components, whereas the exhaust gas or process gas comprises at least one hydrogen chalcogen compound comprising at least one of the following: a) sulfur (S); b) selenium (Se); c) tellurium (Te); and d) polonium (Po), wherein said hydrogen chalcogen compounds are removed in a wet scrubber from the process gas by guiding the process gas into an aqueous solution of at least one base; supplying the least one base to the aqueous solution and extracting an output exhaust gas stream from the aqueous solution, characterized in that the amount of base supplied is controlled such that the pH-value of the solution is larger than 12. The apparatus (1) and the method according to the present invention allow the efficient removal of hydrogen chalcogen compounds from exhaust gases of the production processes of semiconductor compounds like e. g. photovoltaic modules.
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