发明名称 SYSTEM FOR CONTINUOUSLY USING RESIST STRIPPER LIQUID BASED ON NANOFILTRATION
摘要 The objective of the present invention is to realize a system in which a resist stripper liquid used in resist stripping is regulated so as to have a resist component concentration within a certain concentration range even when the resist stripper liquid is continuously used for a long time without replacing it. In stripping a positive resist with a stripper liquid, the resist components dissolving in the stripper liquid can be diminished by cross-flow filtration with a specific ceramic filter (5). In the resist stripping system, a resist-component-containing stripper liquid resulting from a stripping step is treated in a filtration step, and the resultant concentrated stripper liquid having a heightened resist-component concentration is suitably discharged from the system. A fresh stripper liquid is suitably added to the stripper liquid from which the resist components have been removed, and the resultant stripper liquid is reused in the stripping step.
申请公布号 US2011036506(A1) 申请公布日期 2011.02.17
申请号 US20080667300 申请日期 2008.06.27
申请人 TOAGOSEI CO., LTD. 发明人 SUMITA MASANAO;HAYASHI HIDEO
分类号 B32B38/10 主分类号 B32B38/10
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