A METHOD OF FABRICATING AN IMPRINTED SUBSTRATE HAVING REGIONS WITH MODIFIED WETTABILITY

摘要

The invention relates to a method of fabrication of a substrate having a first region with a first wettability degree and a second region with a second wettability degree, the method comprising the steps of: providing the substrate (2) with a roughened surface of a photosensitive layer (4) using embedded nano- and/or microparticles (6); transferring (7) a pattern into the photosensitive layer for obtaining a substrate structure; developing the substrate structure (B) for obtaining the first region corresponding to the substrate (5a) and the second region (5b) corresponding to the roughened photosensitive layer.