| 摘要 |
Provided is a plasma processing apparatus which can generate uniform plasma with excellent repeatability under various process conditions. A plasma processing apparatus (1) is provided with: a waveguide tube (5) which transmits microwaves; an antenna (4) which radiates microwaves which have been radiated from a microwave source through the microwave tube (5); and a top plate (3) which propagates microwaves radiated from the antenna (4) and passes the microwaves into the plasma processing container (1). Furthermore, the plasma processing apparatus (1) is provided with a screw feed mechanism (20) which moves the waveguide tube (5) so as to relatively change the position of the waveguide tube (5) to the antenna (4). |
