发明名称 POLYURETHANE FOAM AND POLISHING PAD
摘要 The present invention provides a polyurethane foam, which, despite having a low specific gravity, has a hardness and an elasticity favorable for a polishing pad, and a polishing pad made using the polyurethane foam. The polyurethane foam is obtained by reacting a blend composition containing (A) a polyisocyanate, (B) a polyol, (C) a chain extender with a molecular weight of equal to or smaller than 400, and (D) water, and in the blend composition, MDI is blended as a main component of the component (A) and a blending amount of the MDI is 45 to 70 parts by weight when a total weight of the respective components (A), (B), and (C) is taken as 100 parts by weight.
申请公布号 KR20110015521(A) 申请公布日期 2011.02.16
申请号 KR20107023651 申请日期 2009.04.21
申请人 TOYO POLYMER CO., LTD.;NITTA HAAS INCORPORATED 发明人 GOTO MICHIRO;TAKEMOTO KAZUO;OOSHIMA NOBUYUKI;HABA SHIN ICHI;YOSHIDA KOUICHI;KAWAI NORIO
分类号 C08G18/48;B24B37/24;C08G18/40;C08G101/00;C08J9/00;H01L21/304 主分类号 C08G18/48
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