发明名称 Palladium plating solution
摘要 The invention provides a plating solution capable of forming a palladium plating film which can further improve solder characteristics in surface treatment of a composition made of a nickel plating film, a palladium plating film and a gold plating film on a surface of a conductor formed from a metal such as copper. In a palladium plating solution of the invention containing a soluble palladium salt and an electrically conductive salt having a liquid composition containing germanium, the amount of the soluble palladium salt is 0.1 g/l to 50 g/l in terms of a reduced value of palladium metal, the amount of the electrically conductive salt is 10 g/l to 400 g/l and the amount of the germanium is 0.1 mg/l to 1000 mg/l.
申请公布号 US7887692(B2) 申请公布日期 2011.02.15
申请号 US20070711516 申请日期 2007.02.27
申请人 ELECTROPLATING ENGINEERS OF JAPAN LIMITED 发明人 WATANABE SHINGO;OHNISHI JUNJI;WACHI HIROSHI;SONE TAKAYUKI
分类号 C25D3/50;C23C16/00;C25D3/56;C25D3/60 主分类号 C25D3/50
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