| 发明名称 |
Plasma processing apparatus |
| 摘要 |
A plasma processing apparatus for generating plasma in a chamber maintained in a vacuum state and processing a substrate using the plasma. The plasma processing apparatus includes a refrigerant channel for circulating a refrigerant formed in a shower head, thereby easily controlling the temperature of the shower head and improving the reproducibility of plasma treatment.
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| 申请公布号 |
US7886687(B2) |
申请公布日期 |
2011.02.15 |
| 申请号 |
US20050313022 |
申请日期 |
2005.12.20 |
| 申请人 |
ADVANCED DISPLAY PROCESS ENGINEERING CO. LTD. |
发明人 |
LEE YOUNG JONG;CHOI JUN YOUNG;JO SAENG HYUN;HWANG YOUNG-JOO;KIM JONG-CHEON |
| 分类号 |
C23C16/50;C23C16/06;C23C16/22;C23C16/503;C23C16/505;C23C16/509;C23F1/00;H01L21/306 |
主分类号 |
C23C16/50 |
| 代理机构 |
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代理人 |
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