| 摘要 |
PURPOSE:To eliminate hindrances to the characteristics of the titled device caused by sputtering at the time of welding or the decrease in reliability by a method wherein the inside of the weld between a cap and a stem subjected to projection welding is provided with a projection and a groove opposed via narrow air gap. CONSTITUTION:The periphery of the cap 6 is provided inside with another annular projection 9 concentrically beside the annular projection 5 for projection welding, and the V-groove 10 is formed in the stem 1 at the position corresponding to the projection 9 inside the cap. The V-groove can be formed by press or by cutting work; however, it must have a depth and a width slightly larger than the height of the projection 9 and its width. This is to produce the air gap 11 between the projection 9 and the groove at the time of projection welding, and then to prevent the flow of current through this part. Thereby, the projection 5 melts and forms a nugget and at the same time sputtering 8 generates; however, it does not come more inside because of the narrow air gap between the inside projection 10 and the V-groove. Therefore, the deposit of the sputtering to a semiconductor element 2, a conductor 4, or a lead terminal 3 is prevented. |
