发明名称 Semiconductor device and method of manufacturing the semiconductor device
摘要 An active region in a semiconductor device is made up of a parallel p-n layer including a first p-semiconductor layer and a first n-semiconductor with the widths and total amounts of impurities being equal to each other to provide a structure in which charges are balanced. A section parallel to stripes in the parallel p-n layer in an inactive region is made up of a second parallel p-n layer including a second p-semiconductor layer, with its width larger than that of the first p-semiconductor layer, and a second n-semiconductor layer with its width smaller than that of the first n-semiconductor layer. The total amount of impurities in the second p-semiconductor layer is made larger than that in the second n-semiconductor layer to provide a structure in which charges are made unbalanced.
申请公布号 US7888243(B2) 申请公布日期 2011.02.15
申请号 US20090569671 申请日期 2009.09.29
申请人 FUJI ELECTRIC SYSTEMS CO., LTD. 发明人 TAKAHASHI KOUTA;IWAMOTO SUSUMU
分类号 H01L21/20;H01L29/78;H01L21/336;H01L21/36;H01L29/06;H01L29/739;H01L29/76 主分类号 H01L21/20
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