MANUFACTURING APPARATUS FOR SEMICONDUCTOR DEVICE

摘要

PURPOSE: A manufacturing apparatus for a semiconductor device is provided to improve the deposition uniformity and etch uniformity on a substrate by spraying a reaction gas through a shower head. CONSTITUTION: A shower head(120) ejects reaction gas inside a reaction chamber(100) A substrate support(110) supports a substrate(10). An injector(130) supplies the reaction gas and clean gas to the shower head. A reaction gas supply unit(140) supplies the reaction gas to the injector through a multi-path. A clean gas supply unit(150) supplies clean gas to the injector.