| 摘要 |
PURPOSE: A photocurable resin composition is provided to ensure excellent antistatic property, surface resistance property, transparency, scratch resistance, and adhesive force to various materials. CONSTITUTION: An antistatic photocurable resin composition includes photopolymerizable urethane acrylate, reactive monomers, photoinitiator, antistatic agent and leveling agent. The photopolymerizable urethane acrylate is included in the amount of 20~60 weight% based on the total weight. A method for preparing the antistatic photocurable resin composition comprises the steps of: injecting a photopolymerizable urethane acrylate oligomer, reactive monomer, photoinitiator, antistatic agent and leveling agent; and stirring the injected materials using an impeller.
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