A MANUFACTURING METHOD OF COLLOIDAL SILICA FOR CHEMICAL MECHENICAL POLISHING

摘要

PURPOSE: A producing method of colloidal silica sol is provided to secure the excellent mechanical and chemical polishing rate of the colloidal silica sol, and to improve the purity of the colloidal silica sol. CONSTITUTION: A producing method of colloidal silica sol comprises the following steps: diluting silica seed sol to distilled water(S10); adding silicon powder to the diluted solution for forming a first dispersion solution(S20); adding a weak basic catalyst, and reacting to make a second dispersion solution(S30); inserting a strong basic catalyst, and reacting to obtain a third dispersion solution(S40); and filtering the third dispersion solution(S50).