发明名称 |
TUNABLE MULTI-ZONE GAS INJECTION SYSTEM |
摘要 |
PROBLEM TO BE SOLVED: To provide a system and a method for gas injection that improve the uniformity and efficiency of plasma treatment. SOLUTION: The system includes: a plasma treatment chamber 10; a vacuum pump, a substrate support 12; a dielectric member 20 facing the substrate support; a gas injector 22; an RF energy source 19; an antenna 18 or the like. The antenna inductively couples energy from the RF energy source with a treatment gas through the dielectric member to form a plasma state and to treat a substrate. The gas injector includes an on-axis exhaust port in a central area and an off-axis exhaust port in an annular area around the central area. The gas injector also includes a plurality of gas injecting ports which can independently supply various amounts of the treatment gases in a variable manner. This arrangement allows the independent adjustment of a gas flow to a plurality of zones in the chamber and various desired changes in gas supply. By using the plasma system, these problems can be solved. COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011029645(A) |
申请公布日期 |
2011.02.10 |
申请号 |
JP20100178983 |
申请日期 |
2010.08.09 |
申请人 |
LAM RESEARCH CORP |
发明人 |
COOPERBERG DAVID J;VAHEDI VAHID;RATTO DOUGLAS;SINGH HARMEET;BENJAMIN NEIL |
分类号 |
H01L21/3065;H05H1/46;C23C16/44;C23C16/455;C23C16/507;C23F4/00;H01J37/32;H01L21/205;H01L21/31 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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