发明名称 TUNABLE MULTI-ZONE GAS INJECTION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a system and a method for gas injection that improve the uniformity and efficiency of plasma treatment. SOLUTION: The system includes: a plasma treatment chamber 10; a vacuum pump, a substrate support 12; a dielectric member 20 facing the substrate support; a gas injector 22; an RF energy source 19; an antenna 18 or the like. The antenna inductively couples energy from the RF energy source with a treatment gas through the dielectric member to form a plasma state and to treat a substrate. The gas injector includes an on-axis exhaust port in a central area and an off-axis exhaust port in an annular area around the central area. The gas injector also includes a plurality of gas injecting ports which can independently supply various amounts of the treatment gases in a variable manner. This arrangement allows the independent adjustment of a gas flow to a plurality of zones in the chamber and various desired changes in gas supply. By using the plasma system, these problems can be solved. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011029645(A) 申请公布日期 2011.02.10
申请号 JP20100178983 申请日期 2010.08.09
申请人 LAM RESEARCH CORP 发明人 COOPERBERG DAVID J;VAHEDI VAHID;RATTO DOUGLAS;SINGH HARMEET;BENJAMIN NEIL
分类号 H01L21/3065;H05H1/46;C23C16/44;C23C16/455;C23C16/507;C23F4/00;H01J37/32;H01L21/205;H01L21/31 主分类号 H01L21/3065
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