发明名称 DETECTION APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD
摘要 The present invention provides a detection apparatus which detects an upper-surface mark and lower-surface mark formed on an upper surface and lower surface, respectively, of a substrate, the apparatus including an optical system configured to form an image of the lower-surface mark on a light-receiving surface of a photoelectric conversion device using a first light, with a wavelength which is transmitted through the substrate, which is emitted by a light source, applied to the lower-surface mark from the upper surface of the substrate, and reflected by the lower-surface mark, and to form an image of the upper-surface mark on the light-receiving surface of the photoelectric conversion device using a second light, with a wavelength which is not transmitted through the substrate, which is emitted by the light source, applied to the upper-surface mark from the upper surface of the substrate, and reflected by the upper-surface mark.
申请公布号 US2011033790(A1) 申请公布日期 2011.02.10
申请号 US20100853705 申请日期 2010.08.10
申请人 CANON KABUSHIKI KAISHA 发明人 MISHIMA KAZUHIKO
分类号 G01B11/14;G03B27/42;G03F7/20 主分类号 G01B11/14
代理机构 代理人
主权项
地址