发明名称 ION-PLASMA PLANT
摘要 An ion-plasma plant relates to technology equipment for application of bimetal coatings with laminar nano-structure of different composition and purpose. Essential feature of plant is use of two coaxial magnetron sprays of radial type with conic cathodes. The magnetron sprays mounted on axis of vacuum chamber with possibility regulation of distance between their. The details are fixed on rotary holder, on which coating is applied. The value of diameter of assembly surface of rotary holder can be adjusted. The holder with details has possibility of planetary and reciprocating moving relative to rotation axis. Present is possibility of regulation of the ratio of distance between magnetron sprays and diameter of assembly surface of holder of details. The plant allows carrying out joint processing of details or application of coatings on internal surface of pipe articles, to increase quality of laminar coatings.
申请公布号 UA93471(C2) 申请公布日期 2011.02.10
申请号 UA20100005669 申请日期 2010.05.11
申请人 INSTITUTE OF TECHNICAL MECHANICS OF NATIONAL ACADEMY OF SCIENCES OF UKRAINE AND NATIONAL SPACE AGENCY OF UKRAINE 发明人 HRYSHKEVYCH ALEKSANDR DMYTROVYCH;HRYNIUK STANISLAV IVANOVYCH
分类号 C23C14/35;C23C14/56 主分类号 C23C14/35
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