| 摘要 |
<P>PROBLEM TO BE SOLVED: To raise energy density by feeding powers of a plurality of high frequency power supplies for plasma, and to suppress a phenomenon in which treatment becomes uneven by high frequency powers simultaneously supplied. <P>SOLUTION: A plurality of the high frequency power supplies 118, 119 are connected to an electrode 120 to generate plasma in this plasma processing device. In this plasma processing device, a reset circuit 117 to make oscillators 112, 116 repeat stoppage of oscillation for a time duration of not more than 10% compared with the time during which oscillation continues and re-oscillation after the stoppage is connected to the oscillators to generate the high frequency signal of any one of the high frequency power supplies. <P>COPYRIGHT: (C)2011,JPO&INPIT |
