| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum processing device, a substrate conveying device and a film forming method that suppress production of particles and decrease replaced components and a replacement frequency. SOLUTION: The substrate conveying device 2 includes a carrier member 4 capable of holding a substrate G in a vertical posture and conveying it on conveyance rails 6, and carrier-side guide magnets 15, 16, 17 and 18 attached to the carrier member 4 always receive horizontal repulsive force from rail-side guide magnets 21, 22, 23 and 24 attached to sides of the rails 6, so that the carrier member 4 can move not in contact with the sides of the right and left rails 6. Further, the rail-side guide magnets 21 and 23 are arranged at a border part between a conveyance space T and a process space P to remove particles. COPYRIGHT: (C)2011,JPO&INPIT
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